Wayne State researchers have developed a new class of
thermally stable, volatile transition chemical compounds that have desirable
properties for the growth of thin films of transition metal-containing materials
by atomic layer deposition and chemical vapor deposition.
Commercial Applications
• Microelectronic devices
o Automotive applications
o Industrial
applications
o Consumer
electronics
o Communications
o Computers and
peripherals
• Thin film batteries
• Protective and
decorative coatings
Competitive Advantages
• Thermal stability at higher temperatures than existing classes of film
growth precursors
• New precursors allow film growth over a broader
temperature range than other classes of precursors
• Precursors have
simple chemical structures, can be prepared from inexpensive reagents, and are
easily purified and manipulated.
Patent Status
Patent Pending
