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Thermal Atomic Layer Etching of Cobalt and Other Transition Metal Films
A novel stepwise chemical etching method for precise and controlled removal of metal surfaces using protic compounds.
Technology Summary
This technology introduces a method for etching metal or element surfaces by initially contacting the surface with a protic compound to create a modified layer, followed by exposure to a protic ligand-forming compound...
Published: 10/28/2025
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Inventor(s): Charles Winter
Keywords(s):
Category(s): Technology Category > Assays, Technology Category > Chemical Processing/Synthesis, Technology Category > Chemicals, Technology Category > Life Science, Technology Category > Materials, Technology Category > Physical Sciences, Technology Category > Physics, Technology Category > Process/Procedure, Technology Category > Small molecule, Technology Category > Specialty compounds, Technology Category > Thin films
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